The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 24, 2012
Filed:
Mar. 31, 2005
Jacques Faguet, Albany, NY (US);
Frank M. Cerio, Jr., Schenectady, NY (US);
Tsukasa Matsuda, Delmar, NY (US);
Kaoru Yamamoto, Delmar, NY (US);
Jacques Faguet, Albany, NY (US);
Frank M. Cerio, Jr., Schenectady, NY (US);
Tsukasa Matsuda, Delmar, NY (US);
Kaoru Yamamoto, Delmar, NY (US);
Tokyo Electron Limited, Tokyo, JP;
Abstract
A plasma enhanced atomic layer deposition (PEALD) method and system, the system including a process chamber and a substrate holder provided within the processing chamber and configured to support a substrate on which a predetermined film will be formed. A first process material supply system is configured to supply a first process material to the process chamber, and a second process material supply system configured to supply a second process material to the process chamber in order to provide a reduction reaction with the first process material to form the predetermined film on the substrate. Also included is a power source configured to couple electromagnetic power to the process chamber to generate a plasma within the process chamber to facilitate the reduction reaction, and a chamber component exposed to the plasma and made from a film compatible material that is compatible with the predetermined film deposited on the substrate.