The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 7837828 B1

PDF
Full Text
Expired
Date of Patent:
Nov. 23, 2010

Filed:

Sep. 09, 2005
Applicants:

Taro Ikeda, Nirasaki, JP;

Sumi Tanaka, Nirasaki, JP;

Kaoru Yamamoto, Nirasaki, JP;

Inventors:

Taro Ikeda, Nirasaki, JP;

Sumi Tanaka, Nirasaki, JP;

Kaoru Yamamoto, Nirasaki, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01); C23C 14/00 (2006.01); C23C 16/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A substrate supportingstructure () for semiconductor processing, comprising a mounting table () for placing a processed substrate (W) disposed in a processing chamber (), wherein temperature control spaces () for storing the fluid used as a heat exchange medium are formed in the mounting table (), a conductive transmission path () is disposed to lead a high frequency power to the mounting table (), and flow channels () feeding or discharging the heat exchange medium fluid to or from the temperature control spaces () are formed in the transmission path ().


Find Patent Forward Citations

Ikeda, Taro. (2010). Substrate supporting structure for semiconductor processing, and plasma processing device (U.S. Patent No. 7837828). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7837828

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