Location History:
- Hatta-Mura, JP (1999)
- Yamanashi-ken, JP (1996 - 2000)
- Kofu, JP (1990 - 2004)
- Nirasaki, JP (2007 - 2015)
- Yamanashi, JP (1994 - 2024)
Company Filing History:
21 out of 10,326 
2 out of 79 
1 out of 984 
Years Active: 1990-2024
Title: Sumi Tanaka: A Pioneer in Substrate Processing Technologies
Introduction
Sumi Tanaka is an esteemed inventor hailing from Nirasaki, Japan, known for his groundbreaking contributions to substrate processing technologies. With an impressive portfolio of 23 patents, his work predominantly focuses on enhancing the efficiency and effectiveness of semiconductor manufacturing processes.
Latest Patents
Two of Sumi Tanaka’s latest patents exemplify his innovative spirit. The first is a substrate processing apparatus that incorporates several advanced features, including a processing chamber, a thermally isolated base, and a unique stage for holding substrates. This design allows for precise control within the processing environment, optimizing substrate treatment.
The second patent involves a plasma processing apparatus designed to improve in-plane uniformity of plasma. This apparatus features a lower stage that enhances the generation of plasma, employing advanced materials like ceramic for the dielectric body and integrating heating elements for optimal performance. The design ensures a more consistent and effective processing of substrates within the semiconductor industry.
Career Highlights
Sumi Tanaka’s career includes notable tenures at prominent companies such as Tokyo Electron Limited and Tokyo Electron Kabushiki Kaisha, where he applied his expertise in innovative technology development. His work there has significantly contributed to advancements in semiconductor processing equipment, establishing him as a crucial figure in the tech industry.
Collaborations
Throughout his career, Sumi Tanaka has collaborated with esteemed individuals such as Shigeru Kasai and Masatake Yoneda. These partnerships have facilitated the exchange of ideas and have been pivotal in the development of his innovative solutions within the substrate processing domain.
Conclusion
Sumi Tanaka's contributions to the field of substrate processing are not just instrumental; they represent a significant advancement in semiconductor technology. With his extensive patent portfolio and successful collaborations, Tanaka continues to inspire future innovations in the industry. His ongoing work promises to influence the evolution of substrate processing methods and apparatus, fostering advancements that will benefit technology and manufacturing sectors worldwide.