The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 16, 2009
Filed:
Jul. 09, 2004
Sumi Tanaka, Yamanashi, JP;
Jun Yamashita, Amagasaki, JP;
Sumi Tanaka, Yamanashi, JP;
Jun Yamashita, Amagasaki, JP;
Tokyo Electron Limited, , JP;
Abstract
A plasma processing apparatusused to execute a specific type of processing such as plasma processing on a workpiece by supplying a processing gas into a chamberwhile applying high-frequency power to generate plasma includes a stageon which the workpiece is placed and a stage supporting unitthat holds the stage. Bellowsandare disposed above and below the stage supporting unitto support the stagein a horizontal state relative to the chamber. Thus, a plasma processing apparatus that does not allow the workpiece stage to become tilted, affords ease of maintenance and is capable of stable processing is provided. In addition, the internal spaces at the bellowsandare used as an exhausting pipe to achieve efficient and uniform exhaustion of the chamber