The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 03, 2010
Filed:
Jul. 03, 2007
Sumi Tanaka, Nirasaki, JP;
Takayuki Kamaishi, Nirasaki, JP;
Kouki Suzuki, Nirasaki, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
A processing gas is prevented from entering into a space below a placement table. A supporting surfacefor supporting the lower face of a placement tableis provided at an inner circumferential portion of the upper end of a support. A circumferentially extending purge gas grooveis formed outside the supporting surface, in an intermediate circumferential portion of the upper end of the support. A narrow flow pathis provided outside the purge gas groove, at a position corresponding to an outer circumferential portion of the upper end of the support. A purge gas fed from purge gas-feeding meansinto the purge gas groove diffuses in the circumferential direction in the purge gas grooveand flows out to the outside from the narrow flow path. Such a flow of the purge gas prevents a processing gas from entering into the purge gas grooveand a space Sbelow the placement table.