The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 18, 2012
Filed:
Mar. 16, 2006
Kenji Suzuki, Guilderland, NY (US);
Atsushi Gomi, Rennselaer, NY (US);
Masamichi Hara, Clifton Park, NY (US);
Yasushi Mizusawa, Albany, NY (US);
Kenji Suzuki, Guilderland, NY (US);
Atsushi Gomi, Rennselaer, NY (US);
Masamichi Hara, Clifton Park, NY (US);
Yasushi Mizusawa, Albany, NY (US);
Tokyo Electron Limited, Tokyo, JP;
Abstract
A method and system is described for reducing particle contamination of a substrate in a deposition system. The deposition system comprises one or more particle diffusers disposed therein and configured to prevent or partially prevent the passage of film precursor particles, or break-up or partially break-up film precursor particles. The particle diffuser may be installed in the film precursor evaporation system, or the vapor delivery system, or the vapor distribution system, or two or more thereof.