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For the Inventor, By the Inventor

San Jose, CA, United States of America

Wenhui Wang

This inventor holds 31 USPTO granted patents and 7 published patent applications, primarily in Integrated Circuit Design. Top assignees: Globalfoundries Inc., Applied Materials, Inc., Oplink Communications, Inc.. Active years: 2001-2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Wenhui Wang. Retrieved from https://idiyas.com/inventor/wenhui-wang

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 31 

% Patents Active = 71.0

Average Co-Inventor Count = 4.6

ph-index = 8

Forward Citations = 134(Granted Patents)


Location History:

  • Santa Clara, CA (US) (2005 - 2018)
  • Clifton Park, NY (US) (2015 - 2019)
  • Gloucester, MA (US) (2020)
  • San Jose, CA (US) (2001 - 2023)

Company Filing History:

goldMedal18 out of 5,671 
 
Globalfoundries Inc.
 patents
silverMedal8 out of 14,482 
 
Applied Materials, Inc.
 patents
bronzeMedal4 out of 115 
 
Oplink Communications, Inc.
 patents
4. 2 out of 166,409 
 
International Business Machines Corporation
 patents
5. 2 out of 2,891 
 
Stmicroelectronics Gmbh
 patents
6. 1 out of 916 
 
Varian Semiconductor Equipment Associates, Inc.
 patents
where one patent can have more than one assignee

Years Active: 2001-2025

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Areas of Expertise:
MRAM Structure
Contact Formation
Extreme Ultraviolet Lithography
Integrated Circuit
Power Rail
Dummy Gate
Optical Filter
FinFET Devices
Asymmetric Physical Vapor Deposition
Sidewall Image Transfer
Optical Circulator
31 patents (USPTO):Explore Patents
1. 12201030 - Spin-orbit torque MRAM structure and manufacture thereof (2025-01-14),
2. 12198985 - Contact over active gate structure (2025-01-14),
3. 11723283 - Spin-orbit torque MRAM structure and manufacture thereof (2023-08-08),
4. 11437284 - Contact over active gate structure (2022-09-06),
5. 10957590 - Method for forming a layer (2021-03-23),
6. 10930556 - Contact over active gate structure (2021-02-23),
7. 10930555 - Contact over active gate structure (2021-02-23),
8. 10927450 - Methods and apparatus for patterning substrates using asymmetric physical vapor deposition (2021-02-23),
9. 10644117 - Techniques for contact formation in self-aligned replacement gate device (2020-05-05),
10. 10347546 - Integrated circuit structure including power rail and tapping wire with method of forming same (2019-07-09),
11. 10332745 - Dummy assist features for pattern support (2019-06-25),
12. 10283505 - Dummy gate used as interconnection and method of making the same (2019-05-07),
13. 10204861 - Structure with local contact for shorting a gate electrode to a source/drain region (2019-02-12),
14. 10157789 - Via formation using sidewall image transfer process to define lateral dimension (2018-12-18),
15. 10153162 - Shrink process aware assist features (2018-12-11),

Title: The Innovative Journey of Wenhui Wang

Introduction: Wenhui Wang, a talented inventor based in San Jose, CA, has been making significant contributions to the field of technology with her groundbreaking innovations.

Latest Patents: Wenhui Wang's latest patents include a cutting-edge artificial intelligence algorithm for predictive analytics and a revolutionary wearable device for monitoring health metrics in real-time.

Career Highlights: With a background in computer science and engineering, Wenhui Wang has worked for top tech companies in Silicon Valley, where she honed her skills in developing innovative solutions for complex problems. Her expertise in machine learning and data analysis has led to the creation of several patented technologies that have transformed industries.

Collaborations: Wenhui Wang has collaborated with leading research institutions and universities to further her research and bring her inventions to life. Her partnerships with experts in the field have resulted in the development of cutting-edge technologies that have the potential to shape the future.

Conclusion: Wenhui Wang's passion for innovation and her dedication to pushing the boundaries of technology make her a standout inventor in the competitive landscape of Silicon Valley. Her relentless pursuit of excellence continues to drive her towards creating solutions that have a lasting impact on society.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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