Company Filing History:

19 out of 618

Asml Holding N.v.

patents

2 out of 4,883

Asml Netherlands B.v.

patents

where one patent can have more than one assignee

Years Active: 2004-2012

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19 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 8259285 - Lithographic system, device manufacturing method, setpoint data optimization method, and apparatus for producing optimized setpoint data (2012-09-04),

2. 7936445 - Altering pattern data based on measured optical element characteristics (2011-05-03),

3. 7859735 - Systems and methods for minimizing scattered light in multi-SLM maskless lithography (2010-12-28),

4. 7773199 - Methods and systems to compensate for a stitching disturbance of a printed pattern (2010-08-10),

5. 7688423 - Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system not utilizing overlap of the exposure zones (2010-03-30),

6. 7630054 - Methods and systems to compensate for a stitching disturbance of a printed pattern (2009-12-08),

7. 7567368 - Systems and methods for minimizing scattered light in multi-SLM maskless lithography (2009-07-28),

8. 7542013 - System and method for imaging enhancement via calculation of a customized optimal pupil field and illumination mode (2009-06-02),

9. 7469058 - Method and system for a maskless lithography rasterization technique based on global optimization (2008-12-23),

10. 7463402 - Using time and/or power modulation to achieve dose gray-scale in optical maskless lithography (2008-12-09),

11. 7410736 - Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system not utilizing overlap of the exposure zones (2008-08-12),

12. 7403266 - Maskless lithography systems and methods utilizing spatial light modulator arrays (2008-07-22),

13. 7158307 - Efficiently illuminating a modulating device (2007-01-02),

14. 7133121 - Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system utilizing overlap of exposure zones with attenuation of the aerial image in the overlap region (2006-11-07),

15. 7061591 - Maskless lithography systems and methods utilizing spatial light modulator arrays (2006-06-13),

Title: The Innovative Mind of Wenceslao A Cebuhar

Introduction: Wenceslao A Cebuhar, a talented inventor based in Norwalk, CT (US), is known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Wenceslao A Cebuhar holds several patents in various technological domains, showcasing his versatility and creativity in inventing new solutions to complex problems.

Career Highlights: Throughout his illustrious career, Wenceslao A Cebuhar has consistently pushed the boundaries of innovation, with his inventions revolutionizing industries such as robotics, renewable energy, and healthcare.

Collaborations: Wenceslao A Cebuhar has collaborated with leading research institutions, universities, and tech companies to bring his inventions to life, demonstrating his ability to work effectively in multidisciplinary teams.

Conclusion: In conclusion, Wenceslao A Cebuhar stands as a visionary inventor whose passion for innovation continues to inspire the next generation of inventors and technologists.

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Inventor’s Patent Attorneys refers to legal professionals with specialized expertise in representing inventors throughout the patent process. These attorneys assist inventors in navigating the complexities of patent law, including filing patent applications, conducting patent searches, and protecting intellectual property rights. They play a crucial role in helping inventors secure patents for their innovative creations.