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Norwalk, CT, United States of America

Wenceslao A Cebuhar

This inventor holds 19 USPTO granted patents. Top assignees: Asml Holding N.v., Asml Netherlands B.v.. Active years: 2004-2012.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Wenceslao A Cebuhar. Retrieved from https://idiyas.com/inventor/wenceslao-a-cebuhar

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 19

% Patents Active = 57.9

Average Co-Inventor Count = 3.8

ph-index = 6

Forward Citations = 90(Granted Patents)

Location History:

Wilton, CT (US) (2006)
Danbury, CT (US) (2008)
Norwalk, CT (US) (2004 - 2012)

Company Filing History:

Asml Holding N.v.

Asml Netherlands B.v.

where one patent can have more than one assignee

Years Active: 2004-2012

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19 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 8259285 - Lithographic system, device manufacturing method, setpoint data optimization method, and apparatus for producing optimized setpoint data (2012-09-04),

2. 7936445 - Altering pattern data based on measured optical element characteristics (2011-05-03),

3. 7859735 - Systems and methods for minimizing scattered light in multi-SLM maskless lithography (2010-12-28),

4. 7773199 - Methods and systems to compensate for a stitching disturbance of a printed pattern (2010-08-10),

5. 7688423 - Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system not utilizing overlap of the exposure zones (2010-03-30),

6. 7630054 - Methods and systems to compensate for a stitching disturbance of a printed pattern (2009-12-08),

7. 7567368 - Systems and methods for minimizing scattered light in multi-SLM maskless lithography (2009-07-28),

8. 7542013 - System and method for imaging enhancement via calculation of a customized optimal pupil field and illumination mode (2009-06-02),

9. 7469058 - Method and system for a maskless lithography rasterization technique based on global optimization (2008-12-23),

10. 7463402 - Using time and/or power modulation to achieve dose gray-scale in optical maskless lithography (2008-12-09),

11. 7410736 - Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system not utilizing overlap of the exposure zones (2008-08-12),

12. 7403266 - Maskless lithography systems and methods utilizing spatial light modulator arrays (2008-07-22),

13. 7158307 - Efficiently illuminating a modulating device (2007-01-02),

14. 7133121 - Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system utilizing overlap of exposure zones with attenuation of the aerial image in the overlap region (2006-11-07),

15. 7061591 - Maskless lithography systems and methods utilizing spatial light modulator arrays (2006-06-13),

Title: The Innovative Mind of Wenceslao A Cebuhar

Introduction: Wenceslao A Cebuhar, a talented inventor based in Norwalk, CT (US), is known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Wenceslao A Cebuhar holds several patents in various technological domains, showcasing his versatility and creativity in inventing new solutions to complex problems.

Career Highlights: Throughout his illustrious career, Wenceslao A Cebuhar has consistently pushed the boundaries of innovation, with his inventions revolutionizing industries such as robotics, renewable energy, and healthcare.

Collaborations: Wenceslao A Cebuhar has collaborated with leading research institutions, universities, and tech companies to bring his inventions to life, demonstrating his ability to work effectively in multidisciplinary teams.

Conclusion: In conclusion, Wenceslao A Cebuhar stands as a visionary inventor whose passion for innovation continues to inspire the next generation of inventors and technologists.

Profile summary based on public USPTO records.

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]

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