The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 09, 2008

Filed:

Jan. 10, 2006
Applicants:

Wenceslao A. Cebuhar, Norwalk, CT (US);

Jason D. Hintersteiner, Bethel, CT (US);

Azat Latypov, Danbury, CT (US);

Gerald Volpe, Stamford, CT (US);

Inventors:

Wenceslao A. Cebuhar, Norwalk, CT (US);

Jason D. Hintersteiner, Bethel, CT (US);

Azat Latypov, Danbury, CT (US);

Gerald Volpe, Stamford, CT (US);

Assignee:

ASML Holding N.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 26/00 (2006.01); G03B 27/54 (2006.01);
U.S. Cl.
CPC ...
Abstract

In lithography applications, it is desirable to control, for example, a position or width of a printed line. An effective method of controlling these patterns and their resolution is by having as many grayscale levels as possible. The present invention comprises methods of grayscaling wherein modulation of the exposure time increases the number of grayscale levels on an object. In addition, the present invention comprises methods of grayscaling wherein modulating the power of an exposure beam provides additional grayscale levels.


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