The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 08, 2009
Filed:
Dec. 13, 2007
Arno Bleeker, Westerhoven, NL;
Wenceslao A. Cebuhar, Norwalk, CT (US);
Justin Kreuzer, Trumbull, CT (US);
Azat Latypov, Danbury, CT (US);
Yuli Vladimirsky, Weston, CT (US);
Arno Bleeker, Westerhoven, NL;
Wenceslao A. Cebuhar, Norwalk, CT (US);
Justin Kreuzer, Trumbull, CT (US);
Azat Latypov, Danbury, CT (US);
Yuli Vladimirsky, Weston, CT (US);
ASML Holding N.V., Veldhoven, NL;
Abstract
A method and system are provided of using a patterning device. An exemplary method includes performing a first exposure of a surface corresponding to image data, determining an image deficiency within a region of the first image, adjusting the image data to compensate for the image deficiency, and performing a second exposure of the surface corresponding to the adjusted image data during a second pass of the patterning device with respect to the surface. The first exposure occurs during a first pass of the patterning device with respect to the surface to produce a first image on the surface.