The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 23, 2008
Filed:
Jan. 27, 2006
Applicants:
Azat Latypov, San Jose, CA (US);
Sherman Poultney, Wilton, CT (US);
Wenceslao Cebuhar, Danbury, CT (US);
Inventors:
Azat Latypov, San Jose, CA (US);
Sherman Poultney, Wilton, CT (US);
Wenceslao Cebuhar, Danbury, CT (US);
Assignee:
ASML Holding N.V., Veldhoven, NL;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06K 9/00 (2006.01); G02F 1/1335 (2006.01); G02F 1/135 (2006.01); G21K 5/00 (2006.01); G03C 5/20 (2006.01); G02B 27/42 (2006.01); G03H 1/12 (2006.01); G03B 27/54 (2006.01);
U.S. Cl.
CPC ...
Abstract
Provided are a method and system for determining states of spatial light modulator (SLM) pixels in a lithography system configured to print a desired pattern. The method includes determining diffraction orders associated with an ideal mask of a pattern to be printed by the lithography system, and then configuring the states of the SLM pixels to match all the diffraction orders that are relevant in the image formation.