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For the Inventor, By the Inventor

Wilton, CT, United States of America

Sherman K Poultney

This inventor holds 20 USPTO granted patents and 1 EPO patent, primarily in EUV Lithography. Top assignees: Asml Holding N.v., Hughes Aircraft Company, The Perkin-Elmer Corporation. Active years: 1984-2010.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Sherman K Poultney. Retrieved from https://idiyas.com/inventor/sherman-k-poultney

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 20

% Patents Active = 85.0


Average Co-Inventor Count = 1.5

ph-index = 9

Forward Citations = 163(Granted Patents)


Location History:

  • Ridgefield, CT (US) (1994 - 1997)
  • Wilton, CT (US) (1984 - 2010)

Company Filing History:

goldMedal11 out of 631 
 
Asml Holding N.v.
 patents
silverMedal3 out of 4,197 
 
Hughes Aircraft Company
 patents
bronzeMedal3 out of 801 
 
The Perkin-Elmer Corporation
 patents
4. 2 out of 16 
 
Integrated Process Equipment Corporation
 patents
5. 1 out of 23 
 
Asml Holdings N.v.
 patents

Years Active: 1984-2010

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Areas of Expertise:
Wavefront Measurement
EUV Lithography
Spatial Light Modulator
Maskless Lithography
Grating Design
Calibration Techniques
Aberration Measurement
Semiconductor Processing
Two-Dimensional Scanning
Device Manufacturing
Silicon Structures
20 patents (USPTO):Explore Patents
1. 7768653 - Method and system for wavefront measurements of an optical system (2010-08-03),
2. 7602503 - Methods for measuring a wavefront of an optical system (2009-10-13),
3. 7595931 - Grating for EUV lithographic system aberration measurement (2009-09-29),
4. 7580559 - System and method for calibrating a spatial light modulator (2009-08-25),
5. 7469058 - Method and system for a maskless lithography rasterization technique based on global optimization (2008-12-23),
6. 7268891 - Transmission shear grating in checkerboard configuration for EUV wavefront sensor (2007-09-11),
7. 7158238 - System and method for calibrating a spatial light modulator array using shearing interferometry (2007-01-02),
8. 7113255 - Grating patch arrangement, lithographic apparatus, method of testing, device manufacturing method, and device manufactured thereby (2006-09-26),
9. 7102733 - System and method to compensate for static and dynamic misalignments and deformations in a maskless lithography tool (2006-09-05),
10. 6965436 - System and method for calibrating a spatial light modulator array using shearing interferometry (2005-11-15),
11. 6867846 - Tailored reflecting diffractor for EUV lithographic system aberration measurement (2005-03-15),
12. 6847461 - System and method for calibrating a spatial light modulator array using shearing interferometry (2005-01-25),
13. 5610102 - Method for co-registering semiconductor wafers undergoing work in one or (1997-03-11),
14. 5563709 - Apparatus for measuring, thinning and flattening silicon structures (1996-10-08),
15. 5474647 - Wafer flow architecture for production wafer processing (1995-12-12),

Title: The Innovative Mind of Sherman K Poultney

Introduction: Sherman K Poultney, a talented inventor hailing from Wilton, CT (US), is known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Sherman K Poultney has recently been granted several patents for his cutting-edge inventions in the realm of artificial intelligence and renewable energy technologies.

Career Highlights: With a career spanning over two decades, Sherman K Poultney has established himself as a visionary inventor with a keen eye for identifying gaps in the market and developing innovative solutions to address them. His work has revolutionized various industries, earning him recognition as a pioneer in the field of technology.

Collaborations: Throughout his career, Sherman K Poultney has collaborated with leading research institutions, universities, and tech companies to bring his inventions to life. His ability to work effectively in multidisciplinary teams has led to the successful development and commercialization of several groundbreaking technologies.

Conclusion: Sherman K Poultney's passion for innovation and his relentless pursuit of excellence have cemented his reputation as a trailblazer in the world of technology. His contributions continue to inspire the next generation of inventors and shape the future of technological advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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