The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 22, 2008
Filed:
Jan. 13, 2006
Arno Bleeker, Westerhoven, NL;
Wenceslao A. Cebuhar, Norwalk, CT (US);
Jason Douglas Hintersteiner, Norwalk, CT (US);
Andrew W. Mccullough, Newtown, CT (US);
Solomon S. Wasserman, Long Beach, NY (US);
Karel Diederick Van Der Mast, Helmond, NL;
Arno Bleeker, Westerhoven, NL;
Wenceslao A. Cebuhar, Norwalk, CT (US);
Jason Douglas Hintersteiner, Norwalk, CT (US);
Andrew W. McCullough, Newtown, CT (US);
Solomon S. Wasserman, Long Beach, NY (US);
Karel Diederick Van Der Mast, Helmond, NL;
ASML Holding N.V., Veldhoven, NL;
Abstract
A maskless lithography system that writes patterns on an object. The system can include an illumination system, the object, spatial light modulators (SLMs), and a controller. The SLMs can pattern light from the illumination system before the object receives the light. The SLMs can include a leading set and a trailing set of the SLMs. The SLMs in the leading and trailing sets change based on a scanning direction of the object. The controller can transmit control signals to the SLMs based on at least one of light pulse period information, physical layout information about the SLMs, and scanning speed of the object. The system can also correct for dose non-uniformity using various methods.