Enter inventor name

Karel Diederick Van Der Mast

USPTO Granted Patents = 29 (Patent Applications = 1)

EPO Patents = 1

Average Co-Inventor Count = 2.7

ph-index = 10

Forward Citations = 696(Granted Patents)

Company Filing History:

18 out of 4,896

Asml Netherlands B.v.

Philips Electron Optics B.v.

patents

4. 1 out of 109

Micronic Laser Systems Ab

Agere Systems Guardian Corp.

patents

7. 1 out of 832,880

Other

patents

where one patent can have more than one assignee

Years Active: 2001-2017

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29 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 9610727 - Imprint lithography (2017-04-04),

2. 8848195 - Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method for determining a property of a substrate (2014-09-30),

3. 8753557 - Imprint lithography (2014-06-17),

4. 8363220 - Method of determining overlay error and a device manufacturing method (2013-01-29),

5. 8100684 - Imprint lithography (2012-01-24),

6. 7961309 - Metrology tool, system comprising a lithographic apparatus and a metrology tool, and a method for determining a parameter of a substrate (2011-06-14),

7. 7878791 - Imprint lithography (2011-02-01),

8. 7777861 - Methods, systems, and computer program products for printing patterns on photosensitive surfaces (2010-08-17),

9. 7656518 - Method of measuring asymmetry in a scatterometer, a method of measuring an overlay error in a substrate and a metrology apparatus (2010-02-02),

10. 7586598 - Metrology tool, system comprising a lithographic apparatus and a metrology tool, and a method for determining a parameter of a substrate (2009-09-08),

11. 7517211 - Imprint lithography (2009-04-14),

12. 7502103 - Metrology tool, system comprising a lithographic apparatus and a metrology tool, and a method for determining a parameter of a substrate (2009-03-10),

13. 7500218 - Lithographic apparatus, method, and computer program product for generating a mask pattern and device manufacturing method using same (2009-03-03),

14. 7403266 - Maskless lithography systems and methods utilizing spatial light modulator arrays (2008-07-22),

15. 7379579 - Imaging apparatus (2008-05-27),

Sure, I will generate an article based on the information provided. Here is the structured article:

Title: Pioneering Inventor: Karel Diederick Van Der Mast

Introduction:

Karel Diederick Van Der Mast, a distinguished inventor hailing from Helmond, Netherlands, has made a significant impact in the field of imprint lithography. With an impressive portfolio of 24 patents to his name, he has continually pushed the boundaries of innovation and technological advancement.

Latest Patents:

Van Der Mast's latest patents showcase his expertise in imprint lithography. One of his notable inventions is an imprint lithography apparatus that features dual arrays of template holders to imprint intricate patterns on substrates. Additionally, he has developed an inspection method and apparatus, a lithographic apparatus, and other cutting-edge technologies aimed at enhancing device manufacturing processes.

Career Highlights:

Throughout his career, Karel Diederick Van Der Mast has been associated with renowned companies such as ASML Netherlands B.V. and ASML Holding N.V. His invaluable contributions have played a pivotal role in advancing lithographic technologies, positioning him as a visionary in the industry.

Collaborations:

Working alongside accomplished individuals like Arno Jan Bleeker and Johan Frederik Dijksman, Van Der Mast has fostered a collaborative environment that fuels innovation and creativity. Together, they have spearheaded numerous projects that have redefined the technological landscape.

Conclusion:

In conclusion, Karel Diederick Van Der Mast's unwavering passion for innovation and his relentless pursuit of excellence have cemented his reputation as a trailblazer in the realm of imprint lithography. His groundbreaking patents and successful collaborations underscore his commitment to driving progress and shaping the future of technology.

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