The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 04, 2017
Filed:
Jun. 13, 2014
Asml Netherlands B.v., Veldhoven, NL;
Yvonne Wendela Kruijt-Stegeman, Eindhoven, NL;
Johan Frederik Dijksman, Weert, NL;
Aleksey Yurievich Kolesnychenko, Helmond, NL;
Karel Diederick Van Der Mast, Helmond, NL;
Klaus Simon, Eindhoven, NL;
Raymond Jacobus Wilhelmus Knaapen, Helmond, NL;
Krassimir Todorov Krastev, Eindhoven, NL;
Sander Frederik Wuister, Eindhoven, NL;
ASML NETHERLANDS B.V., Veldhoven, NL;
Abstract
An imprint lithography apparatus is disclosed that has a first array of template holders, a second array of template holders, and a substrate table arranged to support a substrate to be imprinted, wherein the first array of template holders is arranged to hold an array of imprint templates that can be used to imprint a first array of patterns onto the substrate, and the second array of template holders is arranged hold an array of imprint templates that can be used to imprint a second array of patterns onto the substrate, the patterns imprinted by the second array being interspersed between the patterns imprinted by the first array.