The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 02, 2010

Filed:

Mar. 30, 2007
Applicants:

Arie Jeffrey Den Boef, Waalre, NL;

Karel Diederick Van Der Mast, Helmond, NL;

Maurits Van Der Schaar, Eindhoven, NL;

Inventors:
Assignee:

ASML Netherlands B.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01N 21/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

In a method of measuring asymmetry in a scatterometer, a target portion is illuminated twice, first with 0° of substrate rotation and secondly with 180° of substrate rotation. One of those images is rotated and then that rotated image is subtracted from the other image. In this way, asymmetry of the scatterometer can be corrected.


Find Patent Forward Citations

Den Boef, Arie. (2010). Method of measuring asymmetry in a scatterometer, a method of measuring an overlay error in a substrate and a metrology apparatus (U.S. Patent No. 7656518). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7656518

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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