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Micronic Laser Systems Ab

Calculating rank

USPTO Granted Patents = 109

% Expired Patents = 25.7

EPO Patents = 6

Forward Citations = 2,008

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68 inventors (with patents filed for the assignee):

Torbjorn E Sandstrom (37 out of 46 patents)

Torbjörn Sandström (28 out of 40 patents)

Peter Ekberg (10 out of 10 patents)

4. Torbjörn Sandström (7 out of 8 patents)

5. Ulric Ljungblad (6 out of 26 patents)

6. Martin Olsson (6 out of 8 patents)

7. Lars Ivansen (6 out of 9 patents)

8. Per Askebjer (5 out of 10 patents)

9. Lars Stiblert (4 out of 7 patents)

10. Mats Rosling (3 out of 7 patents)

11. Peter Dürr (3 out of 6 patents)

12. Sten Lindau (3 out of 5 patents)

13. Stefan Gustavson (3 out of 3 patents)

14. Per Elmfors (3 out of 3 patents)

15. Leif Odselius (3 out of 3 patents)

Core Competencies:

SLM Technology

Lithographic Printing

Image Processing

Pattern Generation

Laser Processing

Defective Element Detection

Multi-beam Systems

Calibration Methods

Optical Imaging

Boundary Contrast

High Precision Printing

Data Integrity Checking

109 patents: Sort by Forward Citations

1. 8767185 - Criss-cross writing strategy (2014-07-01),

2. 8767175 - 1.5D SLM for lithography (2014-07-01),

3. 8755590 - Method and device using rotating printing arm to project or view image across a workpiece (2014-06-17),

4. 8743165 - Methods and device for laser processing (2014-06-03),

5. 8570613 - Lithographic printing system with placement corrections (2013-10-29),

6. 8539395 - Method and apparatus for merging multiple geometrical pixel images and generating a single modulator pixel image (2013-09-17),

7. 8537416 - Rotor optics imaging method and system with variable dose during sweep (2013-09-17),

8. 8531755 - SLM device and method combining multiple mirrors for high-power delivery (2013-09-10),

9. 8472089 - Rotor imaging system and method with variable-rate pixel clock (2013-06-25),

10. 8456613 - Method and apparatus for quantification of illumination non-uniformity in the mask plane of a lithographic exposure system (2013-06-04),

11. 8442302 - Method and device using rotating printing arm to project or view image across a workpiece (2013-05-14),

12. 8351020 - Image reading and writing using a complex two-dimensional interlace scheme (2013-01-08),

13. 8312393 - Variable overlap method and device for stitching together lithographic stripes (2012-11-13),

14. 7934172 - SLM lithography: printing to below K1=.30 without previous OPC processing (2011-04-26),

15. 7930653 - Triangulating design data and encoding design intent for microlithographic printing (2011-04-19),

Company Overview

Micronic Laser Systems Ab, based in Täby, Sweden, specializes in advanced lithographic printing technologies. The company focuses on developing and manufacturing systems that utilize SLM (Spatial Light Modulation) technology for high-precision pattern generation and image processing. Their expertise extends to laser processing and calibration methods, enhancing the efficiency and accuracy of lithographic applications. Additionally, Micronic is known for its innovative solutions in defective element detection and multi-beam systems, catering to various industries requiring cutting-edge lithographic solutions.

Profile summary synthesized from public USPTO records and patent filings.

Company Badge

USPTO Data Jan 1 1976 - Oct 27 2026

109 Patents

#2 in Täby

#71 in Sweden

#7,231 in the World

Micronic Laser Systems Ab

Forward Citations = 2,008

68 inventors:

Torbjorn E Sandstrom (37 out of 46 patents)

Torbjörn Sandström (28 out of 40 patents)

Peter Ekberg (10 out of 10 patents)

4. Torbjörn Sandström (7 out of 8 patents)

5. Ulric Ljungblad (6 out of 26 patents)

IDiyas Innovation Intelligence. (2026). Company Patent Portfolio: Micronic Laser Systems Ab. Retrieved from https://idiyas.com/company/micronic-laser-systems-ab

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]

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