The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 04, 2013

Filed:

May. 22, 2008
Applicant:

Torbjörn Sandström, Pixbo, SE;

Inventor:
Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/54 (2006.01); G03B 27/74 (2006.01);
U.S. Cl.
CPC ...
Abstract

This disclosure relates to lithography using pulsed laser illumination. In particular it relates to lithography for producing electronic devices on wafers using multi-mode excimer and molecular lasers, e.g. KrF, ArF, and F2 lasers. It may also apply to illumination systems where several single-mode sources are mixed or one single-mode laser beam is split and recombined with time delays, thereby creating an equivalent multimode source and to EUV lithography. Particular aspects of the present invention are described in the claims, specification and drawings.


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Sandström, Torbjörn. (2013). Method and apparatus for quantification of illumination non-uniformity in the mask plane of a lithographic exposure system (U.S. Patent No. 8456613). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8456613

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