Torbjörn Sandström

Title: Innovations of Torbjörn Sandström: A Journey through Alignments and Mura Reduction

Introduction

Torbjörn Sandström, based in Pixbo, Sweden, is a notable inventor with an impressive portfolio of 40 patents. His work primarily focuses on advancements in photomask writing technologies and methods aimed at reducing visible artifacts known as mura. Through his creative solutions, Sandström has significantly contributed to enhancing precision in various industrial applications.

Latest Patents

Among his latest inventions are two patents that address the critical issue of mura in large area photomasks. The first patent, titled "Mechanically Produced Alignment Fiducial Method and Device," discloses innovative methods and systems used to create alignment marks. These marks play a significant role in realigning a writing coordinate system during exposure writing passes, effectively following the physical movement of the workpiece. The technology employs mechanical pressing, laser ablation, or the application of inks to achieve precise modifications in layers of radiation-sensitive materials.

The second recent patent, "Method and Device for Writing Photomasks with Reduced Mura Errors," presents a systematic approach to writing photomasks. It describes a two-pass writing system that ensures high accuracy by maintaining the optical axes parallel to the movement axes of the stage. By rotating the substrate and utilizing data derived from input specifications processed according to known oblique angles, this method facilitates an accurate overlay of the second exposure pass on the first, significantly reducing mura errors.

Career Highlights

Torbjörn Sandström has an extensive background, having worked with companies such as Micronic Laser Systems AB and Micronic Mydata AB. His experience in these leading organizations has allowed him to cultivate a deep understanding of technologies related to laser systems and photomask production. Sandström’s work in these companies has been instrumental in driving forward innovations that are now considered standard in the industry.

Collaborations

Throughout his career, Sandström has collaborated with notable professionals like Martin Olsson and Lars Stiblert. This teamwork has not only enhanced the quality of his inventions but has also contributed to the creation of cutting-edge solutions that address specific challenges in photomask writing and alignment.

Conclusion

Torbjörn Sandström's contributions through his 40 patents highlight his commitment to innovation within the field of photomask technologies. His latest inventions reveal a strong focus on overcoming the challenges of mura reduction, showcasing the importance of precision in industrial applications. As technology continues to evolve, Sandström's work stands as a testament to the impact that dedicated inventors can have on shaping the future of manufacturing and beyond.