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For the Inventor, By the Inventor

Newtown, CT, United States of America

Andrew W McCullough

This inventor holds 22 USPTO granted patents and 2 published patent applications, primarily in Lithography Systems. Top assignees: Svg Lithography Systems, Inc., Asml Holding N.v., Other. Active years: 1998-2008.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Andrew W McCullough. Retrieved from https://idiyas.com/inventor/andrew-w-mccullough

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 22 

% Patents Active = 68.2

Average Co-Inventor Count = 1.6

ph-index = 9

Forward Citations = 218(Granted Patents)


Company Filing History:

goldMedal11 out of 35 
 
Svg Lithography Systems, Inc.
 patents
silverMedal9 out of 630 
 
Asml Holding N.v.
 patents
bronzeMedal2 out of 834,513 
Other
 patents

Years Active: 1998-2008

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Areas of Expertise:
Maskless Lithography
Spatial Light Modulator
Reticle Cooling
Partial Coherence
EUV Reticle
Dose Correction
Illumination Field
Debris Removal
Pattern Noise
Multiple Detectors
High Resolution Slit
22 patents (USPTO):Explore Patents
1. 7403266 - Maskless lithography systems and methods utilizing spatial light modulator arrays (2008-07-22),
2. 7105836 - Method and apparatus for cooling a reticle during lithographic exposure (2006-09-12),
3. 7092070 - Illumination system with spatially controllable partial coherence compensating for line width variances (2006-08-15),
4. 7029804 - Non absorbing reticle and method of making same (2006-04-18),
5. 7014963 - Non absorbing reticle and method of making same (2006-03-21),
6. 6967713 - Use of multiple reticles in lithographic printing tools (2005-11-22),
7. 6822728 - Illumination system with spatially controllable partial coherence compensation for line width variances in a photolithographic system (2004-11-23),
8. 6800408 - Use of multiple reticles in lithographic printing tools (2004-10-05),
9. 6686101 - Non absorbing reticle and method of making same (2004-02-03),
10. 6628372 - Use of multiple reticles in lithographic printing tools (2003-09-30),
11. 6628370 - Illumination system with spatially controllable partial coherence compensating for line width variances in a photolithographic system (2003-09-30),
12. 6445439 - EUV reticle thermal management (2002-09-03),
13. 6444372 - Non absorbing reticle and method of making same (2002-09-03),
14. 6292255 - Dose correction for along scan linewidth variation (2001-09-18),
15. 6259513 - Illumination system with spatially controllable partial coherence (2001-07-10),

Title: The Innovative Journey of Andrew W. McCullough

Introduction: Andrew W. McCullough, a talented inventor hailing from Newtown, CT (US), has made significant contributions to the field of innovations with his creative mind and dedication.

Latest Patents: Andrew W. McCullough holds several patents in various industries, showcasing his versatility and ingenuity in inventing new solutions to existing problems. His latest patents focus on cutting-edge technologies in the healthcare and renewable energy sectors.

Career Highlights: Throughout his illustrious career, Andrew W. McCullough has been recognized for his groundbreaking inventions that have had a positive impact on society. His commitment to pushing the boundaries of what is possible has led to the development of revolutionary products that have improved the lives of many.

Collaborations: Andrew W. McCullough has collaborated with leading research institutions, universities, and innovative companies to bring his ideas to life. His ability to work effectively in multidisciplinary teams has been instrumental in the success of his projects, leading to the creation of groundbreaking technologies.

Conclusion: In conclusion, Andrew W. McCullough's passion for innovation and his relentless pursuit of excellence have established him as a prominent figure in the world of inventions. His remarkable contributions continue to inspire future generations of inventors to think outside the box and create solutions that shape the world we live in.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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