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For the Inventor, By the Inventor

Wilton, CT, United States of America

Svg Lithography Systems, Inc.

USPTO Granted Patents = 35


Forward Citations = 1,072

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29 inventors (with patents filed for the assignee):

goldMedal Andrew W McCullough (11 out of 22 patents)

silverMedal David M Williamson (5 out of 7 patents)

bronzeMedal Daniel Nicholas Galburt (4 out of 52 patents)

4.  Gregg M Gallatin (4 out of 24 patents)

5.  Orest Engelbrecht (4 out of 8 patents)

6.  Justin Lloyd Kreuzer (3 out of 69 patents)

7.  Stuart T Stanton (3 out of 11 patents)

8.  Pradeep Kumar Govil (3 out of 24 patents)

9.  Mark L Oskotsky (2 out of 28 patents)

10.  Louis Markoya (2 out of 3 patents)

11.  David Callan (2 out of 2 patents)

12.  Joseph L Laganza (2 out of 4 patents)

13.  Joseph Lyons (2 out of 2 patents)

14.  Michael L Nelson (1 out of 13 patents)

15.  Hoon-Yeng Yap (1 out of 5 patents)


Core Competencies:
Catadioptric Lens
Grating Interference
EUV Reticle
Metrology Method
Illumination System
Wafer Alignment
Pattern Noise Reduction
Wafer Handling
Optical Reduction
Debris Removal
Slit Adjustment
Thermal Management

35 patents:

1. 6486940 - High numerical aperture catadioptric lens (2002-11-26),
2. 6469793 - Multi-channel grating interference alignment sensor (2002-10-22),
3. 6445439 - EUV reticle thermal management (2002-09-03),
4. 6444372 - Non absorbing reticle and method of making same (2002-09-03),
5. 6360012 - In situ projection optic metrology method and apparatus (2002-03-19),
6. 6292255 - Dose correction for along scan linewidth variation (2001-09-18),
7. 6259513 - Illumination system with spatially controllable partial coherence (2001-07-10),
8. 6195201 - Reflective fly's eye condenser for EUV lithography (2001-02-27),
9. 6097474 - Dynamically adjustable high resolution adjustable slit (2000-08-01),
10. 6013401 - Method of controlling illumination field to reduce line width variation (2000-01-11),
11. 5973764 - Vacuum assisted debris removal system (1999-10-26),
12. 5966216 - On-axix mask and wafer alignment system (1999-10-12),
13. 5966215 - Line width insensitive wafer target detection in two directions (1999-10-12),
14. 5966202 - Adjustable slit (1999-10-12),
15. 5956192 - Four mirror EUV projection optics (1999-09-21),
Company Overview
Svg Lithography Systems, Inc. is a technology company based in Wilton, Connecticut, specializing in advanced lithography solutions for the semiconductor industry. The organization focuses on developing innovative systems that enhance the precision and efficiency of semiconductor manufacturing processes. With a commitment to research and development, Svg Lithography Systems aims to address the evolving needs of the microelectronics sector, contributing to advancements in various applications, including consumer electronics and telecommunications.
Profile summary synthesized from public USPTO records and patent filings.

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USPTO Data Jan 1 1976 - Oct 20 2026

35 Patents

#5 in Wilton, CT

#249 in Connecticut

#9,756 in US

#19,181 in the World

Wilton, CT (US)
Wilton, CT, United States of America

Svg Lithography Systems, Inc.

Forward Citations = 1,072

29 inventors:

goldMedal Andrew W McCullough (11 out of 22 patents)

silverMedal David M Williamson (5 out of 7 patents)

bronzeMedal Daniel Nicholas Galburt (4 out of 52 patents)

4.  Gregg M Gallatin (4 out of 24 patents)

5.  Orest Engelbrecht (4 out of 8 patents)

IDiyas Innovation Intelligence. (2026). Company Patent Portfolio: Svg Lithography Systems, Inc.. Retrieved from https://idiyas.com/company/svg-lithography-systems

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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