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Wilton, CT, United States of America

Svg Lithography Systems, Inc.

USPTO Granted Patents = 35

CIPO Patents = 14

Forward Citations = 1,066

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29 inventors (with patents filed for the assignee):

Andrew W McCullough (11 out of 22 patents)

David M Williamson (5 out of 7 patents)

Daniel Nicholas Galburt (4 out of 52 patents)

4. Gregg M Gallatin (4 out of 24 patents)

5. Orest Engelbrecht (4 out of 8 patents)

6. Justin Lloyd Kreuzer (3 out of 64 patents)

7. Stuart T Stanton (3 out of 11 patents)

8. Pradeep Kumar Govil (3 out of 24 patents)

9. Mark L Oskotsky (2 out of 27 patents)

10. Louis Markoya (2 out of 3 patents)

11. David Callan (2 out of 2 patents)

12. Joseph L Laganza (2 out of 4 patents)

13. Joseph Lyons (2 out of 2 patents)

14. Michael L Nelson (1 out of 13 patents)

15. Hoon-Yeng Yap (1 out of 5 patents)

35 patents: Sort by Forward Citations

1. 6486940 - High numerical aperture catadioptric lens (2002-11-26),

2. 6469793 - Multi-channel grating interference alignment sensor (2002-10-22),

3. 6445439 - EUV reticle thermal management (2002-09-03),

4. 6444372 - Non absorbing reticle and method of making same (2002-09-03),

5. 6360012 - In situ projection optic metrology method and apparatus (2002-03-19),

6. 6292255 - Dose correction for along scan linewidth variation (2001-09-18),

7. 6259513 - Illumination system with spatially controllable partial coherence (2001-07-10),

8. 6195201 - Reflective fly's eye condenser for EUV lithography (2001-02-27),

9. 6097474 - Dynamically adjustable high resolution adjustable slit (2000-08-01),

10. 6013401 - Method of controlling illumination field to reduce line width variation (2000-01-11),

11. 5973764 - Vacuum assisted debris removal system (1999-10-26),

12. 5966216 - On-axix mask and wafer alignment system (1999-10-12),

13. 5966215 - Line width insensitive wafer target detection in two directions (1999-10-12),

14. 5966202 - Adjustable slit (1999-10-12),

15. 5956192 - Four mirror EUV projection optics (1999-09-21),

SVG Lithography Systems, Inc. is a leading provider of advanced lithography equipment and solutions for the semiconductor industry. With years of experience in the field, we offer a wide range of cutting-edge lithography systems that enable chip manufacturers to achieve high-resolution patterning with utmost precision and efficiency. Our innovative technology and commitment to customer satisfaction have positioned us as a trusted partner for semiconductor companies worldwide. Visit our website to learn more about our products and capabilities.

This text is generated by artificial intelligence and may not be accurate.

Company Badge

USPTO Data Jan 1 1976 - Dec 30 2025

35 Patents

#5 in Wilton, CT

#221 in Connecticut

#9,423 in US

#18,611 in the World

Wilton, CT, United States of America

Svg Lithography Systems, Inc.

Forward Citations = 1,066

29 inventors:

Andrew W McCullough (11 out of 22 patents)

David M Williamson (5 out of 7 patents)

Daniel Nicholas Galburt (4 out of 52 patents)

4. Gregg M Gallatin (4 out of 24 patents)

5. Orest Engelbrecht (4 out of 8 patents)

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