Michael L Nelson

USPTO Granted Patents = 13 (Patent Applications = 1)

Average Co-Inventor Count = 3.9

ph-index = 4

Forward Citations = 88(Granted Patents)

Location History:

W. Redding, CT (US) (1996)
West Redding, CT (US) (2002 - 2015)
Redding, CT (US) (2019 - 2022)

Company Filing History:

Asml Netherlands B.v.

patents

1 out of 35

Svg Lithography Systems, Inc.

where one patent can have more than one assignee

Years Active: 1996-2025

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13 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 12399000 - Systems and methods for measuring intensity in a lithographic alignment apparatus (2025-08-26),

2. RE49066 - Chucks and clamps for holding objects of a lithographic apparatus and methods for controlling a temperature of an object held by a clamp of a lithographic apparatus (2022-05-09),

3. 10324383 - Chucks and clamps for holding objects of a lithographic apparatus and methods for controlling a temperature of an object held by a clamp of a lithographic apparatus (2019-06-18),

4. 9041903 - Mask inspection with fourier filtering and image compare (2015-05-26),

5. 8736810 - EUV reticle substrates with high thermal conductivity (2014-05-27),

6. 7633599 - Apparatuses and methods for changing an intensity distribution of light within an illumination field without distorting the telecentricity of the light (2009-12-15),

7. 7474384 - Lithographic apparatus, device manufacturing method, and a projection element for use in the lithographic apparatus (2009-01-06),

8. 7248336 - Method and system for improving focus accuracy in a lithography system (2007-07-24),

9. 7119883 - Correcting variations in the intensity of light within an illumination field without distorting the telecentricity of the light (2006-10-10),

10. 7053984 - Method and systems for improving focus accuracy in a lithography system (2006-05-30),

11. 6859260 - Method and system for improving focus accuracy in a lithography system (2005-02-22),

12. 6398373 - Pneumatic control system and method for shaping deformable mirrors in lithographic projection systems (2002-06-04),

13. 5559601 - Mask and wafer diffraction grating alignment system wherein the (1996-09-24),

Title: The Innovative Journey of Michael L Nelson

Introduction: Michael L Nelson, a talented inventor based in West Redding, CT (US), has made significant contributions to the field of technology through his creative and groundbreaking inventions.

Latest Patents: Michael L Nelson holds several patents in various technological domains, showcasing his versatility and ingenuity in the innovation landscape.

Career Highlights: Throughout his illustrious career, Michael L Nelson has been at the forefront of technological advancements, consistently pushing the boundaries of what is possible. His dedication to innovation has led to the development of cutting-edge solutions that have revolutionized industries.

Collaborations: Michael L Nelson has collaborated with leading tech companies, research institutions, and universities to further enhance his inventions and bring them to the market. His collaborative spirit has been instrumental in the success of many groundbreaking projects.

Conclusion: Michael L Nelson's passion for innovation, coupled with his relentless drive to create, has established him as a prominent figure in the world of inventors. His remarkable contributions continue to inspire future generations of innovators to push the limits of what is achievable.

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