Joseph L Laganza

Title: Joseph L. Laganza: Innovator in Photolithography Technology

Introduction

Joseph L. Laganza, a prolific inventor based in East Norwalk, CT, has made significant contributions to the field of photolithography, particularly in the development of equipment essential for semiconductor manufacturing. With a portfolio of four patents, his work showcases innovation aimed at improving the precision and efficiency of manufacturing processes.

Latest Patents

Among his notable inventions, Laganza's latest patents include:

1. **Reticle Container with Corner Holding**: This innovative design features a cassette or box for containing and holding a planar substrate, such as a reticle. It incorporates a clamp bar connected to corner supports through a spring or flexure and a linkage. The pivotal attachment allows for movement that facilitates the positioning and handling of the reticle while effectively reducing particulate contamination—crucial in the sensitive environment of semiconductor device fabrication.

2. **Reticle Frame Assembly**: This invention is designed to precisely hold a reticle or mask used in photolithography, ensuring minimal distortion. By utilizing adjusting screws for accurate positioning alongside transversely compliant axial loading springs, Laganza's design mitigates bending forces on the reticle. The inclusion of precision balls to establish a plane further enhances the structural integrity and resolution of the reticle image reproduced on a semiconductor wafer.

Career Highlights

Joseph L. Laganza's career has seen him work with leading companies in the technology sector, most notably the Perkin-Elmer Corporation and SVG Lithography Systems, Inc. His roles in these organizations have allowed him to innovate and contribute to the advancement of lithographic technologies essential for the production of integrated circuits.

Collaborations

Throughout his career, Laganza has collaborated with esteemed colleagues, including Orest Engelbrecht and Hoon-Yeng Yap. These collaborations have further enriched his experience and have led to the continuous evolution of his inventions in photolithography.

Conclusion

Joseph L. Laganza stands out as a noteworthy inventor whose contributions to the field of photolithography significantly enhance semiconductor manufacturing processes. His dedication to innovation is evident through his patents, which address critical challenges in precision, contamination reduction, and distortion reduction. With a strong foundation in both practical application and collaborative development, Laganza's work continues to influence the industry positively.