The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 22, 1991
Filed:
Mar. 25, 1987
Applicant:
Inventors:
Joseph L Laganza, East Norwalk, CT (US);
Orest Engelbrecht, Ridgefield, CT (US);
Assignee:
SVG Lithography Systems, Inc., Wilton, CT (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B41B / ;
U.S. Cl.
CPC ...
33621 ; 33645 ; 33623 ;
Abstract
A reticle frame for precisely holding a reticle or mask used in photolithography with a minimum of distortion. A plurality of adjusting screws are used to accurately position the reticle within the frame. Transversely compliant axial loading springs opposing the adjusting screws reduce the bending forces acting on the reticle. Precision balls are used to establish a plane for the reticle further reducing bending forces thereon causing less distortion and thereby proving greater resolution when the reticle image is reproduced on a semiconductor wafer.