The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 27, 2001
Filed:
Jan. 27, 1999
Donald G. Koch, Burbank, CA (US);
James P. McGuire, Pasadena, CA (US);
Joseph M. Kunick, Hudson, NH (US);
SVG Lithography Systems, Inc., Wilton, CT (US);
Abstract
An illumination source or condenser used to project the image of a reticle onto a photosensitive substrate used in photolithography having a first reflective fly's eye, faceted mirror, or mirror array with predeterminedly positioned facets or elements and a second reflective fly's eye, faceted mirror, or mirror array having predeterminedly positioned facets or elements for creating a desired radiant intensity, pupil fill, or angular distribution. A source of extreme ultraviolet electromagnetic radiation is provided to a first fly's eye or mirror array with arcuate shaped facets or elements. The arcuate shaped facets or elements are positioned to create an image of the source at corresponding facet in a second reflective fly's eye or mirror array. A desired shape and irradiance together with a desired radiant intensity, pupil fill, or angular distribution is obtained. An arcuate illumination field or image is formed with high efficiency in a compact package. The illumination system of the present invention facilitates imaging of feature sizes as small as 0.025 microns, utilizing electromagnetic radiation in the extreme ultraviolet and ranging from 1 nanometer to approximately 157 nanometers.