Hudson, NH, United States of America

Joseph M Kunick

This inventor holds 2 USPTO granted patents. Top assignees: Silicon Valley Group, Inc., Svg Lithography Systems, Inc.. Active years: 2001.


% Patents Active = 100.0

Average Co-Inventor Count = 3.4

ph-index = 2

Forward Citations = 108(Granted Patents)


Company Filing History:


Years Active: 2001

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2 patents (USPTO):Explore Patents

Title: Joseph M Kunick: Innovator in Photolithography

Introduction

Joseph M Kunick is a notable inventor based in Hudson, NH, who has made significant contributions to the field of photolithography. With a total of two patents to his name, Kunick's work focuses on advanced illumination systems that enhance the precision and efficiency of photolithographic processes.

Latest Patents

Kunick's latest patents include a "Zoom Illumination System for Use in Photolithography" and a "Reflective Fly's Eye Condenser for EUV Lithography." The zoom illumination system provides an innovative approach to varying the size of an illumination field incident to a scattering optical element. This system includes an optical source, beam conditioner, optical integrators, and a zoom array integrator, all designed to maintain telecentric illumination at a fixed numerical aperture. The reflective fly's eye condenser is designed to project the image of a reticle onto a photosensitive substrate, utilizing extreme ultraviolet electromagnetic radiation to achieve high efficiency in imaging feature sizes as small as 0.025 microns.

Career Highlights

Throughout his career, Kunick has worked with prominent companies such as SVG Lithography Systems, Inc. and Silicon Valley Group, Inc. His expertise in photolithography has positioned him as a key player in the development of advanced imaging technologies.

Collaborations

Kunick has collaborated with notable professionals in the field, including Donald G Koch and James Patrick McGuire, Jr. These collaborations have contributed to the advancement of photolithographic techniques and technologies.

Conclusion

Joseph M Kunick's innovative work in photolithography has led to significant advancements in illumination systems, showcasing his expertise and dedication to the field. His contributions continue to influence the industry and pave the way for future innovations.

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