Stuart T Stanton

Title: The Innovative Contributions of Stuart T. Stanton

Introduction

Stuart T. Stanton is a prominent inventor based in Bridgewater, NJ (US), known for his significant contributions to the field of lithography. With a total of 11 patents to his name, Stanton has made remarkable advancements in technology that have impacted various industries.

Latest Patents

One of his latest patents is the "Projection electron beam lithography apparatus and method employing an estimator." This innovative process utilizes an estimator, such as a Kalman filter, to control electron beam placement. The Kalman filter receives predictive information from a model and measurement information from a projection electron beam lithography tool. It compensates for factors that cause beam placement errors, such as wafer heating and beam drift. Additionally, the method may employ an adaptive Kalman filter, which receives predictive information from multiple models and measurement information from the lithography tool. This adaptive approach enhances the accuracy of beam placement and allows for real-time process control.

Career Highlights

Stanton has had a distinguished career, working with notable companies such as Lucent Technologies Inc. and SVG Lithography Systems, Inc. His work in these organizations has contributed to the development of advanced lithography technologies.

Collaborations

Throughout his career, Stanton has collaborated with esteemed colleagues, including Donald L. White and George Gustave Zipfel, Jr. These partnerships have fostered innovation and have led to the successful development of various technologies.

Conclusion

Stuart T. Stanton's contributions to the field of lithography through his patents and collaborations highlight his role as a leading inventor. His innovative methods continue to influence the industry and pave the way for future advancements.