The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 15, 2006

Filed:

Oct. 12, 2004
Applicants:

Andrew W. Mccullough, Newtown, CT (US);

Gregg M. Gallatin, Newton, CT (US);

Inventors:

Andrew W. McCullough, Newtown, CT (US);

Gregg M. Gallatin, Newton, CT (US);

Assignee:

ASML Holding N.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/42 (2006.01); G03B 27/54 (2006.01); G03B 27/72 (2006.01);
U.S. Cl.
CPC ...
Abstract

An illumination system having an array optical element with different illumination regions corresponding or matched to different line width variations printed on a photosensitive material. The array optical element may be a filter, diffractive optical element, or micro lens array having illumination regions producing different types of illumination properties or characteristics. Each of the illumination regions are matched or correspond to a respective region on a patterning device to provide optimized exposure of a photosensitive material. The optical element may be used to tailor a conventional illumination system to the unique characteristics of the projection optics used in a system, thereby compensating for vertical and horizontal bias or variations in line width for features oriented in the vertical and horizontal direction.


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