The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 07, 2006

Filed:

Apr. 05, 2005
Applicants:

Arno Bleeker, Westerhoven, NL;

Wenceslao A. Cebuhar, Norwalk, CT (US);

Justin Kreuzer, Trumbull, CT (US);

Azat Latypov, Danbury, CT (US);

Yuli Vladimirsky, Weston, CT (US);

Inventors:

Arno Bleeker, Westerhoven, NL;

Wenceslao A. Cebuhar, Norwalk, CT (US);

Justin Kreuzer, Trumbull, CT (US);

Azat Latypov, Danbury, CT (US);

Yuli Vladimirsky, Weston, CT (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/32 (2006.01); G03B 27/68 (2006.01); G03B 27/54 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method and system are provided for printing a pattern on a photosensitive surface using a spatial light modulator (SLM). An exemplary method includes defining two or more exposure areas on the photosensitive surface, the exposure areas overlapping along respective edge portions of the exposure areas to form an overlap zone therebetween. Two or more exposure areas are exposed to print an image therein, the exposing extending through the overlap zone. The exposing within the overlap zone is then attenuated.


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