The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 28, 2009
Filed:
Jan. 06, 2005
Wenceslao A. Cebuhar, Norwalk, CT (US);
Jason D. Hintersteiner, Bethel, CT (US);
Stan Janik, Naugatuck, CT (US);
Yuli Vladimirsky, Weston, CT (US);
Wenceslao A. Cebuhar, Norwalk, CT (US);
Jason D. Hintersteiner, Bethel, CT (US);
Stan Janik, Naugatuck, CT (US);
Yuli Vladimirsky, Weston, CT (US);
ASML Holding N.V., Veldhoven, NL;
Abstract
The present invention is directed to a lithography system in which scattered light from a pattern generator, having one or more pattern generating devices, is blocked from an object, such as a wafer or display. The system includes a pattern generator with multiple pattern generating devices, a projection system for directing light from the pattern generating device, and an aperture located at or near an object window. The aperture has a profile that matches the configuration of the pattern generating devices. A method for blocking scattered light in a lithography system using multiple pattern generating devices is also provided.