Hsinchu, Taiwan

Tzer-Min Shen

This inventor holds 46 USPTO granted patents and 20 published patent applications, primarily in Semiconductor Devices. Top assignees: Taiwan Semiconductor Manufacturing Comp. Ltd., United Microelectronics Corp., TSMC Nanjing Company, Limited. Active years: 2008-2026.

USPTO Granted Patents = 46 

% Patents Active = 95.7

Average Co-Inventor Count = 5.8

ph-index = 4

Forward Citations = 58(Granted Patents)


Company Filing History:


Years Active: 2008-2026

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Areas of Expertise:
Semiconductor Devices
FinFET Structures
2D-Channel Transistors
Work Function Tuning
Integrated Circuit
Memory Circuits
Channel Strain
MOSFET Structures
Graphene Layer
Source-Drain Engineering
Contact Structures
Tunable Threshold Voltage
46 patents (USPTO):Explore Patents

Title: Innovations and Contributions of Tzer-Min Shen in Semiconductor Technology

Introduction

Tzer-Min Shen, based in Hsinchu, Taiwan, is a prominent inventor and innovator in the field of semiconductor technology. With an impressive portfolio boasting 38 patents, he has made significant contributions that enhance semiconductor device design and functionality. His work reflects a deep understanding of materials science and engineering principles that drive innovation in the electronics industry.

Latest Patents

Among Tzer-Min Shen's latest patents are significant advancements in semiconductor devices and methods of fabrication. One of his notable patents involves a semiconductor device that comprises a first electrode layer, a ferroelectric layer, a first alignment layer made from rare-earth metal oxide, and a second electrode layer. This configuration is strategically designed to optimize the performance of semiconductor devices.

Another patent focuses on the development of a spacer structure for semiconductor devices, detailing a method of forming a fin structure over a substrate that contains a channel layer and a sacrificial layer. The method includes intricate steps such as the formation of recess structures and an oxygen-free cyclic etching process, which selectively etches the dielectric layer to expose the channel layer. These innovations showcase Shen's commitment to enhancing semiconductor manufacturing processes.

Career Highlights

Tzer-Min Shen has worked with leading companies in the semiconductor industry, such as Taiwan Semiconductor Manufacturing Company (TSMC) and United Microelectronics Corporation (UMC). His roles in these organizations have allowed him to further refine his skills and push the boundaries of semiconductor technology through practical applications and innovative processes.

Collaborations

Throughout his career, Tzer-Min Shen has collaborated with esteemed colleagues, including Zhiqiang Wu and Yen-Tien Tung. These partnerships have fostered a creative environment for the exchange of ideas and the development of groundbreaking technologies in the semiconductor field.

Conclusion

Tzer-Min Shen's dedication to innovation in semiconductor technology is evident from his extensive patent portfolio and collaborative work in the industry. As he continues to develop new technologies and methodologies, his contributions are likely to shape the future landscape of semiconductor devices, ensuring that we remain at the forefront of electronic advancements.

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