Tsan-Chun Wang

This inventor holds 73 USPTO granted patents and 2 published patent applications and 1 EPO patent, primarily in Semiconductor Fabrication (CPC class H01L). Top assignees: Taiwan Semiconductor Manufacturing Comp. Ltd., Au Optronics Corporation. Active years: 2012-2025.

USPTO Granted Patents = 73 (Patent Applications = 2)

% Patents Active = 84.9

EPO Patents = 1 (Patent Applications = 1)

Average Co-Inventor Count = 3.0

ph-index = 7

Forward Citations = 180(Granted Patents)

Forward Citations (Not Self Cited) = 161(Dec 10, 2025)

Inventors with similar research interests:

Company Filing History:

63 out of 42,711

Taiwan Semiconductor Manufacturing Comp. Ltd.

patents

10 out of 4,577

Au Optronics Corporation

patents

Years Active: 2012-2025

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Areas of Expertise:

Fin-Type Transistor

Gate Structure

Ion Implantation

Semiconductor Process

Multi-Gate Transistor

Interlayer Dielectric

CVD Quality Control

Plasma Doping

Sacrificial Layer

Device Structure

Fabrication Method

Solid Phase Diffusion

73 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 12211843 - Manufacturing method of fin-type field effect transistor structure (2025-01-28),

2. 12211701 - Gate structure of semiconductor device and method of manufacture (2025-01-28),

3. 12205994 - Sacrificial layer for semiconductor process (2025-01-21),

4. 11848361 - Sacrificial layer for semiconductor process (2023-12-19),

5. 11728219 - Method for fabricating a semiconductor device (2023-08-15),

6. 11677012 - Method of manufacturing semiconductor devices (2023-06-13),

7. 11532485 - Process for making multi-gate transistors and resulting structures (2022-12-20),

8. 11361977 - Gate structure of semiconductor device and method of manufacture (2022-06-14),

9. 11289479 - Fin-type field effect transistor structure and manufacturing method thereof (2022-03-29),

10. 11257911 - Sacrificial layer for semiconductor process (2022-02-22),

11. 11127817 - Formation of semiconductor device structure by implantation (2021-09-21),

12. 11043580 - Method of manufacturing semiconductor devices (2021-06-22),

13. 11031293 - Method for fabricating a semiconductor device (2021-06-08),

14. 11011428 - Method for fabricating a semiconductor device (2021-05-18),

15. 10854729 - Method to reduce etch variation using ion implantation (2020-12-01),

Title: The Innovative Journey of Inventor Tsan-Chun Wang

Introduction: Tsan-Chun Wang, a pioneering inventor hailing from Hsinchu, Taiwan, has made significant contributions to the field of technology and innovation through his groundbreaking inventions.

Latest Patents: Wang's latest patents focus on advancements in semiconductor technology, particularly in the development of cutting-edge microchips with enhanced processing capabilities and efficiency.

Career Highlights: With a career spanning over two decades, Tsan-Chun Wang has established himself as a leading figure in the tech industry. His work has been instrumental in shaping the future of semiconductor manufacturing and has earned him recognition as a visionary inventor.

Collaborations: Throughout his career, Wang has collaborated with top research institutions and leading tech companies to further his research and bring his inventions to life. His partnerships have been crucial in pushing the boundaries of technological innovation.

Conclusion: Tsan-Chun Wang's relentless pursuit of innovation and his passion for pushing the limits of technology have solidified his position as a trailblazing inventor in the field of semiconductor technology. His contributions continue to inspire future generations of inventors and shape the landscape of the tech industry.