Location History:
- Sumida, JP (2016 - 2018)
- Tokyo, JP (2012 - 2022)
- Taito Tokyo, JP (2020 - 2022)
Company Filing History:
27 out of 52,735 
11 out of 2,955 
2 out of 2,750 
Years Active: 2012-2022
Areas of Expertise:
Title: The Innovative Contributions of Tomoaki Sawabe
Introduction: Tomoaki Sawabe, based in Tokyo, Japan, is a prominent inventor recognized for his significant contributions to the field of pattern formation materials. With an impressive portfolio of 40 patents, he has made substantial advancements in innovative materials and methods that impact various technological domains.
Latest Patents: Among his latest innovations are two notable patents focused on pattern formation materials and methods. The first patent details a unique pattern formation material that includes a first monomer with specific chemical structures. This monomer comprises a first molecular chain, which facilitates the absorption of metallic elements, therefore enhancing the functionality of the patterned film. The second patent introduces a polymer that consists of multiple monomer units, each equipped with an ester structure containing carbonyl groups. This innovation ensures that the second carbonyl group in the polymer's structure is maintained in a linear chain configuration, providing increased stability and adaptability for varied applications.
Career Highlights: Tomoaki Sawabe has had a successful career, having worked with esteemed organizations such as Toshiba Corporation and Toshiba Memory Corporation. His experience in these leading companies has significantly shaped his expertise and innovative approach in the realm of material science and engineering.
Collaborations: Throughout his career, Tomoaki has collaborated with notable coworkers, including Shintaro Enomoto and Tomio Ono. These partnerships have fostered a creative environment that encourages groundbreaking developments and further enhances the potential applications of his innovations.
Conclusion: Tomoaki Sawabe's extensive portfolio of patents exemplifies his dedication to advancing the field of pattern formation materials. His innovative approaches not only contribute to the technological landscape in Japan but also have the potential to inspire future developments across various industries globally.