The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 29, 2020
Filed:
Mar. 08, 2018
Toshiba Memory Corporation, Kanagawa, JP;
Koji Asakawa, Kawasaki Kanagawa, JP;
Seekei Lee, Kawasaki Kanagawa, JP;
Naoko Kihara, Matsudo Chiba, JP;
Norikatsu Sasao, Kawasaki Kanagawa, JP;
Tomoaki Sawabe, Taito Tokyo, JP;
Shinobu Sugimura, Yokohama Kanagawa, JP;
Toshiba Memory Corporation, Tokyo, JP;
Abstract
According to one embodiment, a pattern formation method is disclosed. The method can include a film formation process, and a exposure process. The film formation process forms a pattern formation material film on a base body. The pattern formation material film includes a pattern formation material including a first portion and a second portion. The first portion includes at least one of acrylate or methacrylate. The second portion includes an alicyclic compound and a carbonyl group. The alicyclic compound has an ester bond to the at least one of the acrylate or the methacrylate. The carbonyl group is bonded to the alicyclic compound. The exposure process causes the pattern formation material film to expose to a metal compound including a metallic element.