logo

For the Inventor, By the Inventor

The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 11320736 B1

PDFFull Text
Date of Patent:
May. 03, 2022

Filed:

Sep. 06, 2018

Pattern forming material and pattern forming method

Applicant:

Kioxia Corporation, Tokyo, JP;

Inventors:

Ryosuke Yamamoto, Aichi, JP;

Seiji Morita, Tokyo, JP;

Norikatsu Sasao, Kanagawa, JP;

Koji Asakawa, Kanagawa, JP;

Tomoaki Sawabe, Tokyo, JP;

Shinobu Sugimura, Kanagawa, JP;

Assignee:

KIOXIA CORPORATION, Tokyo, JP;

Attorney:

Finnegan, Henderson, Farabow, Garrett & Dunner L.L.P.

Primary Examiner:

Thomas T Pham

Int. Cl.
CPC ...
H01L 21/308 (2006.01); H01L 21/311 (2006.01); G03F 7/09 (2006.01); C08F 220/08 (2006.01); C08F 212/08 (2006.01); C08F 120/08 (2006.01); G03F 7/00 (2006.01); G03F 7/004 (2006.01); G03F 7/20 (2006.01); C08F 120/28 (2006.01); G03F 7/40 (2006.01); H01L 21/033 (2006.01); C08F 220/28 (2006.01); H01L 27/11582 (2017.01);
U.S. Cl.
CPC ...
G03F 7/091 (2013.01); C08F 120/08 (2013.01); C08F 120/28 (2013.01); C08F 212/08 (2013.01); C08F 220/08 (2013.01); C08F 220/283 (2020.02); G03F 7/0035 (2013.01); G03F 7/0047 (2013.01); G03F 7/094 (2013.01); G03F 7/2043 (2013.01); G03F 7/405 (2013.01); H01L 21/0332 (2013.01); H01L 21/31144 (2013.01); H01L 27/11582 (2013.01);
Abstract

A pattern forming material according to an embodiment is a pattern forming material comprising a polymer composed of a plurality of monomer units bonded to each other. Each of the monomer units includes an ester structure having a first carbonyl group and at least one second carbonyl group bonded to the ester structure. A second carbonyl group farthest from a main chain of the polymer constituting the pattern forming material among second carbonyl groups is in a linear chain state.

Find Patent Forward Citations

Yamamoto, Ryosuke. (2022). Pattern forming material and pattern forming method (U.S. Patent No. 11320736). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11320736

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…