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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10534260 B1

PDFFull Text
Date of Patent:
Jan. 14, 2020

Filed:

Aug. 13, 2018

Pattern formation method

Applicant:

Toshiba Memory Corporation, Tokyo, JP;

Inventors:

Tomoaki Sawabe, Tokyo, JP;

Shinobu Sugimura, Kanagawa, JP;

Koji Asakawa, Kanagawa, JP;

Assignee:

Toshiba Memory Corporation, Tokyo, JP;

Attorney:

Finnegan, Henderson, Farabow, Garrett & Dunner, L.L.P.

Primary Examiner:

Lan Vinh

Int. Cl.
CPC ...
H01L 21/027 (2006.01); G03F 7/00 (2006.01); H01L 21/308 (2006.01); H01L 21/3065 (2006.01); G03F 7/075 (2006.01); C09C 1/30 (2006.01); C03C 17/22 (2006.01); C03C 17/30 (2006.01); H01L 21/3105 (2006.01); H01L 21/033 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0002 (2013.01); C03C 17/22 (2013.01); C03C 17/30 (2013.01); C09C 1/3081 (2013.01); G03F 7/075 (2013.01); H01L 21/0271 (2013.01); H01L 21/0273 (2013.01); H01L 21/0337 (2013.01); H01L 21/3065 (2013.01); H01L 21/3081 (2013.01); H01L 21/3086 (2013.01); H01L 21/31058 (2013.01); C03C 2217/76 (2013.01);
Abstract

According to one embodiment, a pattern formation method can include performing a first processing of causing a surface of a first member of a processing body to be hydrophobic. The processing body includes the first member and a second member. The second member is provided at a portion of the first member. The method can include performing a second processing of causing the processing body to contact an atmosphere including a metal compound. The second processing is after the first processing. The method can include performing a third processing of processing the processing body in an atmosphere including at least one selected from the group consisting of water, oxygen, and ozone. The third processing is after the second processing. In addition, the method can include removing, after the third processing, at least a portion of another portion of the first member by using the second member as a mask.

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