The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 05, 2022
Filed:
Mar. 13, 2018
Kioxia Corporation, Tokyo, JP;
Koji Asakawa, Kawasaki Kanagawa, JP;
Naoko Kihara, Matsudo Chiba, JP;
Seekei Lee, Kawasaki Kanagawa, JP;
Norikatsu Sasao, Kawasaki Kanagawa, JP;
Tomoaki Sawabe, Taito Tokyo, JP;
Shinobu Sugimura, Yokohama Kanagawa, JP;
Kioxia Corporation, Tokyo, JP;
Abstract
According to one embodiment, a pattern formation material includes a first monomer. The first monomer includes a first molecular chain, a first group, and a second group. The first molecular chain includes a first end and a second end. The first group has an ester bond to the first end. The second group has an ester bond to the second end. The first group is one of acrylic acid or methacrylic acid. The second group is one of acrylic acid or methacrylic acid. The first molecular chain includes a plurality of first elements bonded in a straight chain configuration. The first elements are one of carbon or oxygen. The number of the first elements is 6 or more. A film including the first monomer is caused to absorb a metal compound including a metallic element.