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For the Inventor, By the Inventor

San Jose, CA, United States of America

Todd P Lukanc

This inventor holds 72 USPTO granted patents and 1 EPO patent, primarily in Integrated Circuit Design (CPC class H01L). Top assignees: Advanced Micro Devices Corporation, Globalfoundries Inc., Cypress Semiconductor Corporation. Active years: 1999-2016.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Todd P Lukanc. Retrieved from https://idiyas.com/inventor/todd-p-lukanc

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 72

% Patents Active = 77.8


Average Co-Inventor Count = 2.7

ph-index = 16

Forward Citations = 800(Granted Patents)

Forward Citations (Not Self Cited) = 793(Dec 10, 2025)


Inventors with similar research interests:


Company Filing History:

goldMedal66 out of 13,168 
 
Advanced Micro Devices Corporation
 patents
silverMedal3 out of 5,671 
 
Globalfoundries Inc.
 patents
bronzeMedal1 out of 3,596 
 
Cypress Semiconductor Corporation
 patents
4. 1 out of 1,075 
 
Spansion LLC.
 patents
5. 1 out of 834,513 
Other
 patents

Years Active: 1999-2016

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Areas of Expertise:
Optical Lithography
Photoresist Exposure
Mask Generation
Integrated Circuits
Metrology Techniques
Patterning Properties
Phase Shift Masks
Manufacturability
Semiconductor Devices
Design Rule Creation
Trench Formation
Illumination Profile
72 patents (USPTO):Explore Patents
1. 9274410 - Method and system for automated generation of masks for spacer formation from a desired final wafer pattern (2016-03-01),
2. 9064078 - Methods and systems for designing and manufacturing optical lithography masks (2015-06-23),
3. 8975195 - Methods for optical proximity correction in the design and fabrication of integrated circuits (2015-03-10),
4. 8003545 - Method of forming an electronic device including forming features within a mask and a selective removal process (2011-08-23),
5. 7657864 - System and method for integrated circuit device design and manufacture using optical rule checking to screen resolution enhancement techniques (2010-02-02),
6. 7543256 - System and method for designing an integrated circuit device (2009-06-02),
7. 7487492 - Method for increasing manufacturability of a circuit layout (2009-02-03),
8. 7368225 - Two mask photoresist exposure pattern for dense and isolated regions (2008-05-06),
9. 7313769 - Optimizing an integrated circuit layout by taking into consideration layout interactions as well as extra manufacturability margin (2007-12-25),
10. 7269804 - System and method for integrated circuit device design and manufacture using optical rule checking to screen resolution enhancement techniques (2007-09-11),
11. 7207017 - Method and system for metrology recipe generation and review and analysis of design, simulation and metrology results (2007-04-17),
12. 7194725 - System and method for design rule creation and selection (2007-03-20),
13. 7108946 - Method of lithographic image alignment for use with a dual mask exposure technique (2006-09-19),
14. 7076750 - Method and apparatus for generating trenches for vias (2006-07-11),
15. 7071085 - Predefined critical spaces in IC patterning to reduce line end pull back (2006-07-04),

Title: Todd P Lukanc - Innovator from San Jose

Introduction: Todd P Lukanc is a renowned inventor based in San Jose, California. With a passion for innovation and problem-solving, he has made significant contributions to various fields through his inventive spirit.

Latest Patents: Todd P Lukanc holds several patents in the areas of technology and consumer electronics, showcasing his expertise in creating cutting-edge solutions for everyday challenges.

Career Highlights: Throughout his career, Todd P Lukanc has worked with leading tech companies, where he has played a key role in developing groundbreaking products that have revolutionized the industry.

Collaborations: Known for his collaborative nature, Todd P Lukanc has partnered with top researchers and engineers to bring his ideas to life, fostering a culture of innovation and excellence in all his projects.

Conclusion: Todd P Lukanc's dedication to innovation and his remarkable track record of success make him a standout figure in the world of inventors, inspiring others to push the boundaries of what is possible.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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