The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 04, 2006
Filed:
May. 25, 2004
Todd P. Lukanc, San Jose, CA (US);
Luigi Capodieci, Santa Cruz, CA (US);
Christopher A. Spence, Sunnyvale, CA (US);
Joerg Reiss, Sunnyvale, CA (US);
Sarah N. Mcgowan, San Francisco, CA (US);
Todd P. Lukanc, San Jose, CA (US);
Luigi Capodieci, Santa Cruz, CA (US);
Christopher A. Spence, Sunnyvale, CA (US);
Joerg Reiss, Sunnyvale, CA (US);
Sarah N. McGowan, San Francisco, CA (US);
Advanced Micro Devices, Inc., Sunnyvale, CA (US);
Abstract
The invention includes an apparatus and a method of manufacturing such apparatus including the steps of: forming a layer to be patterned, forming a photosensitive layer over the layer to be patterned, patterning the photosensitive layer to form a pattern including a horizontal line and a vertical line without a space therebetween, transferring the pattern to the layer to be patterned, forming a second photosensitive layer over the pattern, patterning the second photosensitive layer to form a second pattern including a space aligned between the horizontal line and the vertical line, and transferring the second pattern to the layer to be patterned to form a third pattern including a horizontal line and a vertical line with a space therebetween, the space including a width dimension achievable at a resolution limit of lithography.