The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 17, 2007
Filed:
Jun. 10, 2004
Cyrus Tabery, Santa Clara, CA (US);
Chris Haidinyak, Santa Cruz, CA (US);
Todd P. Lukanc, San Jose, CA (US);
Luigi Capodieci, Santa Cruz, CA (US);
Carl P. Babcock, Campbell, CA (US);
Hung-eil Kim, San Jose, CA (US);
Christopher A. Spence, Los Altos, CA (US);
Cyrus Tabery, Santa Clara, CA (US);
Chris Haidinyak, Santa Cruz, CA (US);
Todd P. Lukanc, San Jose, CA (US);
Luigi Capodieci, Santa Cruz, CA (US);
Carl P. Babcock, Campbell, CA (US);
Hung-eil Kim, San Jose, CA (US);
Christopher A. Spence, Los Altos, CA (US);
Advanced Micro Devices, Inc., Sunnyvale, CA (US);
Abstract
A method of generating a metrology recipe includes identifying regions of interest within a device layout. A coordinate list, which corresponds to the identified regions of interest, can be provided and used to create a clipped layout, which can be represented by a clipped layout data file. The clipped layout data file and corresponding coordinate list can be provided and converted into a metrology recipe for guiding one or more metrology instruments in testing a processed wafer and/or reticle. The experimental metrology results received in response to the metrology request can be linked to corresponding design data and simulation data and stored in a queriable database system.