San Jose, CA, United States of America

Hung-Eil Kim


Average Co-Inventor Count = 2.1

ph-index = 8

Forward Citations = 244(Granted Patents)


Company Filing History:


Years Active: 2003-2011

where 'Filed Patents' based on already Granted Patents

21 patents (USPTO):

Title: Innovations and Contributions of Hung-Eil Kim

Introduction

Hung-Eil Kim is a prominent inventor based in San Jose, California, renowned for his innovative contributions to the field of electronic devices and integrated circuit technology. With a remarkable portfolio of 21 patents to his name, Kim has played a critical role in advancing methods that enhance electronic device manufacturing and optical proximity correction.

Latest Patents

Among his latest patented inventions are the following:

1. **Method of forming an electronic device including forming features within a mask and a selective removal process**: This invention describes a method where a patterned mask layer is formed over an underlying layer with several features. Notably, it emphasizes the selective removal of portions of the underlying layer while retaining significant features, which is crucial for refining electronic device fabrication techniques.

2. **Method and apparatus for optimizing an optical proximity correction model**: This patent outlines a procedure for creating an OPC model to optimize design target features in integrated circuits. This method includes matching optical profiles of test and target features to enhance the accuracy of metrology requests, thereby improving the overall quality of integrated circuit manufacturing.

Career Highlights

Throughout his career, Hung-Eil Kim has collaborated with leading technology companies, notably Advanced Micro Devices Corporation (AMD) and Spansion LLC. His extensive experience at these companies has allowed him to contribute significantly to the development of state-of-the-art technologies in the semiconductor industry.

Collaborations

Hung-Eil Kim has worked closely with notable colleagues such as Todd P. Lukanc and Cyrus E. Tabery. Their collaborations have fostered an environment of innovation, leading to substantial advancements in their respective fields and adding value to the technology landscape.

Conclusion

Hung-Eil Kim continues to be a driving force in the innovation of electronic devices and integrated circuit technologies. His patented methods reflect a deep understanding of complex manufacturing processes, ensuring that his contributions have a lasting impact on the industry. Through his ongoing work and collaborations, Kim exemplifies the spirit of innovation that propels technology forward.

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