The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 20, 2006
Filed:
May. 04, 2004
Applicant:
Hung-eil Kim, San Jose, CA (US);
Inventor:
Hung-Eil Kim, San Jose, CA (US);
Assignee:
Advanced Micro Devices, Inc., Sunnyvale, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 17/50 (2006.01);
U.S. Cl.
CPC ...
Abstract
A method verifying an optical proximity correction (OPC) model is disclosed. The method can include correcting a test pattern having a plurality of structures and extracting critical dimension (CD) values from a corrected output file for layout locations corresponding to a plurality of selected structures of the test pattern. A data set from the extracted CD values can be developed where the data set is indicative of corrected test pattern CD versus pitch for at least one target CD. Also disclosed is a method of collecting wafer test measurement data.