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Hsinchu, Taiwan

Tien-Lu Lin

USPTO Granted Patents = 101 (Patent Applications = 14)

Average Co-Inventor Count = 4.8

ph-index = 6

Forward Citations = 149(Granted Patents)

Forward Citations (Not Self Cited) = 139(Dec 10, 2025)

Inventors with similar research interests:

Location History:

Hsinchu, TW (2004 - 2024)
Hsinchu County, TW (2024)

Company Filing History:

101 out of 40,674

Taiwan Semiconductor Manufacturing Comp. Ltd.

Years Active: 2004-2025

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Areas of Expertise:

Semiconductor Structure

Low Parasitic Capacitance

Source Drain Metal Contact

Contact Resistance

Field Effect Transistors

Multi Layer Dielectric

Interconnect Structure

Butted Contacts

Air Gap Technology

Transistor Device

Laminated Layer

Isolation Structure

101 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 12464764 - Low parasitic capacitance contact structure (2025-11-04),

2. 12463095 - Semiconductor structure with a laminated layer (2025-11-04),

3. 12446275 - Semiconductor device and manufacturing method thereof (2025-10-14),

4. 12432994 - Source/drain metal contact and formation thereof (2025-09-30),

5. 12389665 - Semiconductor device structure (2025-08-12),

6. 12382709 - Semiconductor device structure and method for forming the same (2025-08-05),

7. 12266566 - Contact resistance between via and conductive line (2025-04-01),

8. 12183784 - Semiconductor device with air gap on gate structure and method for forming the same (2024-12-31),

9. 12159922 - Method of fabricating semiconductor device (2024-12-03),

10. 12131942 - Source/drain isolation structure and methods thereof (2024-10-29),

11. 12125912 - Semiconductor device structure and method for forming the same preliminary class (2024-10-22),

12. 12087860 - Methods of forming contact features in field-effect transistors (2024-09-10),

13. 12057398 - Semiconductor device with multi-layer dielectric and methods of forming the same (2024-08-06),

14. 12051646 - Metal line structure and method (2024-07-30),

15. 12040273 - Semiconductor device with multi-layer dielectric (2024-07-16),

Title: The Innovative Journey of Tien-Lu Lin

Introduction: Tien-Lu Lin, a distinguished male inventor hailing from Hsinchu, Taiwan, has made significant contributions to the world of innovations and patents.

Latest Patents: Tien-Lu Lin's latest patents showcase his expertise in the field of robotics and sustainable energy solutions, with a focus on enhancing efficiency and reducing environmental impact.

Career Highlights: Throughout his illustrious career, Tien-Lu Lin has been at the forefront of groundbreaking inventions, revolutionizing industries such as electronics, renewable energy, and healthcare with his cutting-edge technologies.

Collaborations: Tien-Lu Lin has collaborated with leading research institutions, universities, and companies worldwide to bring his inventions to life, fostering a culture of innovation and excellence in the global community.

Conclusion: In conclusion, Tien-Lu Lin's passion for innovation, coupled with his relentless pursuit of excellence, has solidified his reputation as a visionary inventor shaping the future of technology.

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