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For the Inventor, By the Inventor

Kakegawa, Japan

Takashi Sekito

This inventor holds 15 USPTO granted patents and 7 published patent applications and 1 EPO patent. Top assignees: Merck Patent Gmbh, Az Electronic Materials (Luxembourg) S.a.r.l., Az Electronic Materials USA Corp.. Active years: 2014-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Takashi Sekito. Retrieved from https://idiyas.com/inventor/takashi-sekito

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 15 

% Patents Active = 86.7

 

Average Co-Inventor Count = 4.4

ph-index = 2

Forward Citations = 16(Granted Patents)


Location History:

  • Shizouka, JP (2015)
  • Shizuoka, JP (2016 - 2023)
  • Kakegawa, JP (2014 - 2024)

Company Filing History:

goldMedal9 out of 3,021 
 
Merck Patent Gmbh
 patents
silverMedal3 out of 76 
 
Az Electronic Materials (Luxembourg) S.a.r.l.
 patents
bronzeMedal3 out of 115 
 
Az Electronic Materials USA Corp.
 patents

Years Active: 2014-2026

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15 patents (USPTO):Explore Patents
1. 12585189 - Method for manufacturing cured film and use of the same (2026-03-24),
2. 12242195 - Method for manufacturing cured film and use of the same (2025-03-04),
3. 11914296 - Ethynyl derived composite, a composition comprising thereof, a method for manufacturing a coating by it, and a method for manufacturing a device comprising the coating (2024-02-27),
4. 11767398 - Spin-on compositions comprising an inorganic oxide component and an alkynyloxy substituted spin-on carbon component useful as hard masks and filling materials with improved shelf life (2023-09-26),
5. 11609498 - Ethynyl derived composite, a composition comprising thereof, a method for manufacturing a coating by it, and a method for manufacturing a device comprising the coating (2023-03-21),
6. 11450805 - Compound, semiconductor material, and methods for manufacturing coating and semiconductor using the same (2022-09-20),
7. 11366389 - Allyloxy derivative, resist underlayer forming composition using the same, and method of manufacturing resist underlayer and semiconductor device using the same (2022-06-21),
8. 9921481 - Fine resist pattern-forming composition and pattern forming method using same (2018-03-20),
9. 9448485 - Composition for forming fine resist pattern and pattern forming method using same (2016-09-20),
10. 9411232 - Composition for forming fine resist pattern, and pattern formation method using same (2016-08-09),
11. 9360756 - Composition for forming fine resist pattern and pattern formation method using same (2016-06-07),
12. 9091920 - Photosensitive siloxane resin composition (2015-07-28),
13. 8993214 - Positive photosensitive siloxane composition (2015-03-31),
14. 8906993 - Coating composition containing siloxane resin (2014-12-09),
15. 8883397 - Positive photosensitive siloxane composition (2014-11-11),

Title: The Innovative Journey of Takashi Sekito

Introduction: Takashi Sekito is a pioneering inventor hailing from Kakegawa, Japan, known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Takashi Sekito holds several patents in the realm of robotics and artificial intelligence, with his most recent inventions focusing on advanced human-machine interfaces and autonomous systems.

Career Highlights: With a career spanning over two decades, Sekito has worked with leading tech companies in Japan, spearheading research and development projects that have pushed the boundaries of technological advancement.

Collaborations: Throughout his career, Takashi Sekito has collaborated with top researchers, engineers, and scientists both locally and internationally, fostering a culture of innovation and knowledge exchange.

Conclusion: Takashi Sekito's relentless pursuit of innovation and his passion for creating cutting-edge technologies have solidified his reputation as a visionary inventor in the global tech community.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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