The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 04, 2025
Filed:
Apr. 24, 2020
Applicant:
Merck Patent Gmbh, Darmstadt, DE;
Inventors:
Takashi Sekito, Kakegawa, JP;
Shigemasa Nakasugi, Yamato, JP;
Hiroshi Yanagita, Kakegawa, JP;
Taku Hirayama, Kakegawa, JP;
Assignee:
Merck Patent GmbH, Darmstadt, DE;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 7/11 (2006.01); C08G 61/10 (2006.01); C09D 165/00 (2006.01); G03F 7/09 (2006.01);
U.S. Cl.
CPC ...
G03F 7/11 (2013.01); C08G 61/10 (2013.01); C09D 165/00 (2013.01); G03F 7/094 (2013.01); C08G 2261/124 (2013.01); C08G 2261/1424 (2013.01); C08G 2261/18 (2013.01); C08G 2261/228 (2013.01); C08G 2261/312 (2013.01); C08G 2261/3142 (2013.01);
Abstract
To provide a method for manufacturing a cured film having high film density, high film hardness and high etching resistance. A method for manufacturing a cured film comprising (1) applying a composition (i) above a substrate; (2) forming a hydro-carbon-containing film from the composition (i); and (3) irradiating the hydrocarbon-containing film with plasma, electron beam and/or ion to form a cured film. Use of the cured film.