The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 07, 2016
Filed:
Oct. 01, 2013
Kazuma Yamamoto, Shizuoka, JP;
Masahiro Ishii, Shizuoka, JP;
Takashi Sekito, Shizuoka, JP;
Hiroshi Yanagita, Shizuoka, JP;
Shigemasa Nakasugi, Shizuoka, JP;
Go Noya, Shizuoka, JP;
Kazuma Yamamoto, Shizuoka, JP;
Masahiro Ishii, Shizuoka, JP;
Takashi Sekito, Shizuoka, JP;
Hiroshi Yanagita, Shizuoka, JP;
Shigemasa Nakasugi, Shizuoka, JP;
Go Noya, Shizuoka, JP;
AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L., Luxembourg, LU;
Abstract
The present invention provides a fine pattern-forming composition enabling to form a resist pattern having high dry etching resistance, and also provides a pattern formation method using that composition. This formation method hardly causes pipe blockages in the production process. The composition is used for miniaturizing a resist pattern by fattening in a process of forming a negative resist pattern from a chemically amplified resist composition, and comprises a polymer containing a repeating unit having a hydroxyaryl group and an organic solvent not dissolving the negative resist pattern. In the formation method, the fine pattern-forming composition and the resist composition are individually cast with the same coating apparatus, so as to prevent pipe blockages.