The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 28, 2015
Filed:
May. 17, 2012
Takashi Sekito, Kakegawa, JP;
Daishi Yokoyama, Kakegawa, JP;
Takashi Fuke, Kakegawa, JP;
Yuki Tashiro, Kakegawa, JP;
Toshiaki Nonaka, Kakegawa, JP;
Yasuaki Tanaka, Kakegawa, JP;
Takashi Sekito, Kakegawa, JP;
Daishi Yokoyama, Kakegawa, JP;
Takashi Fuke, Kakegawa, JP;
Yuki Tashiro, Kakegawa, JP;
Toshiaki Nonaka, Kakegawa, JP;
Yasuaki Tanaka, Kakegawa, JP;
Merck Patent GmbH, Darmstadt, DE;
Abstract
[Object] To provide a photosensitive siloxane resin composition excellent in alkali-solubility and in sensitivity, and also to provide a pattern-formation method employing that. [Means] The present invention provides a photosensitive siloxane resin composition comprising: a siloxane resin having silanol groups or alkoxysilyl groups, a crown ether, a photosensitive material, and an organic solvent. This photosensitive composition is cast on a substrate, subjected to imagewise exposure, treated with an alkali aqueous solution, and cured to form a pattern.