Company Filing History:

5 out of 72

Az Electronic Materials (luxembourg) S.a.r.l.

patents

Az Electronic Materials USA Corp.

patents

4. 1 out of 374

Sakai Display Products Corporation

patents

where one patent can have more than one assignee

Years Active: 2014-2024

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11 patents (USPTO):Sort by Forward Citations

Abstract keywords

1. 11899365 - Photosensitive siloxane composition and pattern forming method using the same (2024-02-13),

2. 11467494 - Positive type photosensitive polysiloxane composition (2022-10-11),

3. 10620538 - Positive type photosensitive siloxane composition, active matrix substrate, display apparatus, and method of manufacturing active matrix substrate (2020-04-14),

4. 9684240 - Negative-working photosensitive siloxane composition (2017-06-20),

5. 9580567 - Positive-type photosensitive siloxane composition (2017-02-28),

6. 9505888 - Composite of metal oxide nanoparticles and silsesquioxane polymer, method for producing same, and composite material produced using composite thereof (2016-11-29),

7. 9164386 - Negative-working photosensitive siloxane composition (2015-10-20),

8. 9091920 - Photosensitive siloxane resin composition (2015-07-28),

9. 8993214 - Positive photosensitive siloxane composition (2015-03-31),

10. 8906993 - Coating composition containing siloxane resin (2014-12-09),

11. 8883397 - Positive photosensitive siloxane composition (2014-11-11),

Title: Takashi Fuke: Innovator in Photosensitive Siloxane Compositions

Introduction

Takashi Fuke is a prominent inventor based in Kakegawa, Japan. He has made significant contributions to the field of materials science, particularly in the development of photosensitive siloxane compositions. With a total of 11 patents to his name, Fuke has established himself as a key figure in innovation.

Latest Patents

Fuke's latest patents include a photosensitive siloxane composition and a pattern forming method using the same. This invention aims to provide a photosensitive siloxane composition capable of forming a pattern with a desired taper angle and linewidth. The composition comprises a polysiloxane with a specific structure, a photoactive agent, and a solvent. Another notable patent is for a positive type photosensitive polysiloxane composition. This invention addresses the challenge of manufacturing a cured film with high surface smoothness while suppressing wrinkle generation, even without the addition of curing auxiliaries or flood exposure.

Career Highlights

Throughout his career, Takashi Fuke has worked with notable companies such as Az Electronic Materials and Merck Patent GmbH. His experience in these organizations has contributed to his expertise in the field of photosensitive materials.

Collaborations

Fuke has collaborated with several professionals in his field, including Toshiaki Nonaka and Daishi Yokoyama. These collaborations have further enhanced his innovative capabilities and contributions to the industry.

Conclusion

Takashi Fuke's work in photosensitive siloxane compositions showcases his dedication to innovation and excellence in materials science. His patents reflect a commitment to solving complex challenges in the field, making him a noteworthy inventor in the industry.

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