The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 20, 2015
Filed:
Apr. 05, 2013
AZ Electronic Materials (Luxembourg) S.a.r.l., Somerville, NJ (US);
Daishi Yokoyama, Shizuoka, JP;
Atsuko Noya, Shizuoka, JP;
Yuji Tashiro, Shizuoka, JP;
Naofumi Yoshida, Shizuoka, JP;
Yasuaki Tanaka, Shizuoka, JP;
Takashi Fuke, Shizuoka, JP;
Megumi Takahashi, Shizuoka, JP;
Katsuto Taniguchi, Shizuoka, JP;
Toshiaki Nonaka, Shizuoka, JP;
AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L., Luxembourg, LU;
Abstract
[Object] To provide a negative-working photosensitive siloxane composition developable inorganically, and also to provide a cured film-manufacturing method employing that. [Means] The present invention provides a negative-working photosensitive siloxane composition comprising a polysiloxane, a silicon-containing compound having a pKa of 2.0 to 15.7, a photo-polymerization initiator, and a solvent. This composition is coat on a substrate, exposed to light, developed with an inorganic developer, and heated, so that a cured film can be obtained.