Kakegawa, Japan

Toshiaki Nonaka

USPTO Granted Patents = 35 


Average Co-Inventor Count = 4.4

ph-index = 3

Forward Citations = 94(Granted Patents)


Location History:

  • Saitama, JP (2000)
  • Iruma, JP (1999 - 2001)
  • Shizouka, JP (2015)
  • Shizuoka, JP (2012 - 2019)
  • Machida, JP (2019 - 2022)
  • Kakegawa, JP (2002 - 2023)
  • Tokyo, JP (2005 - 2024)

Company Filing History:


Years Active: 1999-2024

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35 patents (USPTO):

Title: The Innovative Journey of Inventor Toshiaki Nonaka

Introduction:

Toshiaki Nonaka is a prolific inventor based in Kakegawa, Japan, with a remarkable portfolio of 34 patents to his name. His dedication to pushing the boundaries of innovation is evidenced by his latest patents, which focus on cutting-edge advancements in the field of materials science.

Latest Patents:

Among Toshiaki Nonaka's recent patents is the invention of a Polysiloxane compound capable of forming a cured film with exceptional heat resistance. This innovation addresses the need for materials that can produce thick films without compromising on quality. Another notable patent is a method for manufacturing fine patterns and display devices, showcasing his versatility in different technological domains.

Career Highlights:

Toshiaki Nonaka has contributed his expertise to renowned companies such as Merck Patent GmbH and AZ Electronic Materials (Luxembourg) S.A.R.L. His innovative spirit and commitment to excellence have led to groundbreaking advancements in the industry, cementing his reputation as a leading figure in the world of patents and inventions.

Collaborations:

Throughout his career, Toshiaki Nonaka has collaborated with esteemed colleagues such as Daishi Yokoyama and Rainer Wingen. These partnerships have been instrumental in driving forward innovative projects and achieving significant milestones in the field of materials science.

Conclusion:

Inventor Toshiaki Nonaka's prolific career is a testament to his passion for innovation and his relentless pursuit of excellence. His groundbreaking patents and successful collaborations highlight his significant contributions to the world of technology and serve as an inspiration for future inventors and researchers.

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